Early Stage Oxynitridation Process of Si(001) Surface by NO gas: Reactive Molecular Dynamics Simulation Study

Title
Early Stage Oxynitridation Process of Si(001) Surface by NO gas: Reactive Molecular Dynamics Simulation Study
Authors
이광렬김승철최근수Haining CaoPooja Srivastava
Issue Date
2016-04
Publisher
Journal of applied physics
Citation
VOL 119, 125305
URI
http://pubs.kist.re.kr/handle/201004/59674
ISSN
00218979
Appears in Collections:
KIST Publication > Article
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