Hydrogenated amorphous/nanocrystalline silicon thin films on porous anodic alumina substrate

Title
Hydrogenated amorphous/nanocrystalline silicon thin films on porous anodic alumina substrate
Authors
김상옥Aliaksandr Khodin이중기
Keywords
Hydrogenated amorphous silicon; porous anodic alumina; chemical vapor deposition; textured surfaces; Raman spectra; X-ray diffraction
Issue Date
2010-06
Publisher
Surface review and letters
Citation
VOL 17, NO 3, 283-288
Abstract
Hydrogenated amorphous and nanocrystalline silicon thin films were grown on porous anodic alumina substrates using electron cyclotron resonance-chemical vapor deposition technique from argon, hydrogen and silane gas composition. The structural characterization of the deposited hydrogenated silicon films were performed by scanning electron microscopy, Raman spectroscopy, and X-ray diffraction studies. The results revealed that mixed amorphous/ nanocrystalline silicon phases with specific novel morphology were obtained on textured surfaces. The evolution of the film on ripple-like surface exhibited amorphous dominant structure, however, the film deposited on tipped/ribbed surface consisted of amorphous and nanocrystalline phases composite. The growth process strongly depends on the textured substrate pattern, which influences on the nanostructure shapes and crystallinity.
URI
http://pubs.kist.re.kr/handle/201004/37888
ISSN
0218-625X
Appears in Collections:
KIST Publication > Article
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