Hydrogenated amorphous/nanocrystalline silicon thin films on porous anodic alumina substrate
- Hydrogenated amorphous/nanocrystalline silicon thin films on porous anodic alumina substrate
- 김상옥; Aliaksandr Khodin; 이중기
- Hydrogenated amorphous silicon; porous anodic alumina; chemical vapor deposition; textured surfaces; Raman spectra; X-ray diffraction
- Issue Date
- Surface review and letters
- VOL 17, NO 3, 283-288
- Hydrogenated amorphous and nanocrystalline silicon thin films were grown on porous
anodic alumina substrates using electron cyclotron resonance-chemical vapor deposition technique
from argon, hydrogen and silane gas composition. The structural characterization of
the deposited hydrogenated silicon films were performed by scanning electron microscopy,
Raman spectroscopy, and X-ray diffraction studies. The results revealed that mixed amorphous/
nanocrystalline silicon phases with specific novel morphology were obtained on textured
surfaces. The evolution of the film on ripple-like surface exhibited amorphous dominant
structure, however, the film deposited on tipped/ribbed surface consisted of amorphous and
nanocrystalline phases composite. The growth process strongly depends on the textured substrate
pattern, which influences on the nanostructure shapes and crystallinity.
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