Nanomorph silicon grown on template alumina substrate by plasma-enhanced CVD
- Nanomorph silicon grown on template alumina substrate by plasma-enhanced CVD
- A. Khodin; 이중기; 김창삼; 김상옥
- CVD; silicon; Nanocrystal; plasma processing; template; amorphous materials; Chemical vapour deposition
- Issue Date
- Materials letters
- VOL 63, 2552-2555
- Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma
enhanced CVD using template porous alumina substrate. The growing heterogeneous Si layer is composed of
nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman
spectroscopy and XRD data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches
forming the honeycomb net and presumably amorphous Si:H areas between them.
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