Nanomorph silicon grown on template alumina substrate by plasma-enhanced CVD

Title
Nanomorph silicon grown on template alumina substrate by plasma-enhanced CVD
Authors
A. Khodin이중기김창삼김상옥
Keywords
CVD; silicon; Nanocrystal; plasma processing; template; amorphous materials; Chemical vapour deposition
Issue Date
2009-10
Publisher
Materials letters
Citation
VOL 63, 2552-2555
Abstract
Novel morphology of amorphous/nanocrystalline (nanomorph) silicon has been obtained by plasma enhanced CVD using template porous alumina substrate. The growing heterogeneous Si layer is composed of nanocrystalline and amorphous distinct areas, conformal to the tipped/ribbed alumina template. Raman spectroscopy and XRD data evidence the plasma-assisted preferential growth of nanocrystalline Si bunches forming the honeycomb net and presumably amorphous Si:H areas between them.
URI
http://pubs.kist.re.kr/handle/201004/36121
ISSN
0167-577X
Appears in Collections:
KIST Publication > Article
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