A study on characteristics of hydrogenated amorphous/nanocrystalline silicon thin film on porous anodic alumina substrate
- A study on characteristics of hydrogenated amorphous/nanocrystalline silicon thin film on porous anodic alumina substrate
- 김상옥; Aliaksandr KHODIN; 이중기
- Hydrogenated amorphous silicon; Porous anodic alumina; Chemical vapor deposition; Textured surfaces; Raman spectra; X-ray diffraction
- Issue Date
- International symposium on Function Materials (ISFM2009)
- Hydrogenated silicon thin films were deposited by Electron Cyclotron Resonance - Chemical Vapor Deposition(ECR-CVD) method on the textured substrate. Textured substrate was used to scatter light at interface, which lead to enhance photon absorption and the stabilized efficiency. Chemical vapor deposition methods enable to coat convoluted shape of the textured surface. In the present study, microwave power and the H2/SiH4 feeding ratio were employed as major process parameters to control the degree of crystallinity of the silicon films. Raman scattering studies were carried out to analyze the crystalline volume fraction of thin Si layer. The structural properties of these films were investigated by x-ray diffraction(XRD), and scanning electron microscopy(SEM). The optical properties of the formed film were characterized by UV-Vis spectroscopy
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